Thin film etching and deposition equipment

     EZAN jointly with the Institute of Microelectronics Technology and High-Purity Materials of the Russian Academy of Sciences developed and manufactured equipment for thin film precision etching and deposition based on using microwave plasma under electron cyclotron resonance (ECR) conditions. The equipment shows a number of advantages with respect to equipment used to date in microelectronics. ECR equipment can be applied to standard technological processes as well to scientific and novel tasks.